FREMONT, Calif., Feb. 19, 2025 /PRNewswire/ — Lam Research Corp. (Nasdaq: LRCX) today unveiled ALTUS ® Halo, the world’s first atomic layer deposition (ALD) tool that harnesses the capabilities of the ...
Companies to Focus on Patterning for Leading-Edge Chips, Including Dry Resist EUV Lithography and Next-Generation Materials Lam, JSR agreement intended to drive the industry's transition to next-gen ...
Lam Research Corporation LRCX continues to ride strong momentum in its systems business, driven by customer demand for its advanced deposition and etch tools. In the third quarter of fiscal 2025, ...
"Building on Lam's deep metallization expertise, ALTUS Halo is the most significant breakthrough in atomic layer deposition in over 20 years," said Sesha Varadarajan, senior vice president and general ...
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